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    Get Insights with Semiconductor Failure Analysis Tools

    Explore our range of advanced products for semiconductor failure analysis at SEMISHARE Prober. Equip yourself with new solutions to uncover valuable insights.

    SEMISHARE: Pioneering Advanced Semiconductor Failure Analysis Solutions

    In the intricate world of semiconductor manufacturing, where precision and reliability are paramount, the ability to identify and address failures is crucial. Semiconductor failure analysis stands as a critical process, helping manufacturers unravel the complex mysteries behind component failures and ensure the utmost reliability of these sophisticated devices. At the forefront of this vital field is SEMISHARE Prober, offering a suite of cutting-edge products specifically engineered for semiconductor failure analysis, providing invaluable insights that drive continuous improvement in the industry.

    Understanding the Semiconductor Failure Analysis Process

    The semiconductor failure analysis process is a meticulous journey of discovery, involving a systematic approach to identify the root causes of device malfunctions. This process is far more than a simple troubleshooting procedure; it's a comprehensive investigation that can reveal critical insights about design flaws, manufacturing inconsistencies, and even potential improvements in semiconductor technology.

    Key Steps in the Semiconductor Failure Analysis Process:

    1. Failure Verification: Confirming the reported failure mode

    2. Non-Destructive Testing: Initial examinations that preserve the device's integrity

    3. Device De-processing: Carefully removing layers to access internal structures

    4. Microscopic Analysis: Detailed examination using advanced imaging techniques

    5. Chemical and Material Analysis: Investigating composition and contamination

    6. Electrical Testing: Probing the device's electrical characteristics

    7. Data Analysis and Reporting: Synthesizing findings into actionable insights

    SEMISHARE's advanced tools and expertise support each of these critical steps, ensuring a thorough and accurate semiconductor failure analysis process.

    Methods of IC Failure Analysis: A Deep Dive

    Integrated Circuit (IC) failure analysis is a complex field that requires a diverse array of sophisticated techniques. SEMISHARE's suite of tools encompasses a wide range of these methods, enabling comprehensive semiconductor failure analysis.

    Advanced IC Failure Analysis Methods:

    1. Optical Microscopy: For initial visual inspection and surface analysis

    2. Scanning Electron Microscopy (SEM): Providing high-resolution imaging of device structures

    3. Energy-Dispersive X-ray Spectroscopy (EDX): Analyzing elemental composition

    4. Focused Ion Beam (FIB): For precise cross-sectioning and circuit modification

    5. Time-Domain Reflectometry (TDR): Identifying discontinuities in high-speed circuits

    6. Electron Beam Induced Current (EBIC): Localizing defects in semiconductor junctions

    7. Photon Emission Microscopy: Detecting abnormal current flow in active devices

    Each of these methods plays a crucial role in semiconductor failure analysis, offering unique insights into the complex world of IC functionality and failure modes.

    FMEA in Semiconductor: Proactive Failure Prevention

    Failure Modes and Effects Analysis (FMEA) is a proactive risk assessment tool widely used in the semiconductor industry. It's a structured approach to identifying potential failure modes, their effects, and their causes before they occur in actual devices.

    Key Aspects of FMEA in Semiconductor Failure Analysis:

    1. Identification of Potential Failure Modes: Analyzing how a device might fail

    2. Assessment of Failure Effects: Evaluating the impact of each failure mode

    3. Risk Prioritization: Ranking failure modes based on severity, occurrence, and detection

    4. Mitigation Strategies: Developing preventive measures for high-risk failure modes

    5. Continuous Improvement: Regularly updating the FMEA based on new data and insights

    SEMISHARE's tools and expertise support the implementation of FMEA in semiconductor failure analysis, helping manufacturers stay ahead of potential issues and improve product reliability.

    Common Causes of Failure in Semiconductors

    Understanding the root causes of semiconductor failures is crucial for improving device reliability and performance. Through extensive semiconductor failure analysis, SEMISHARE has identified several common causes of semiconductor failures:

    1. Material Defects: Impurities or structural flaws in the semiconductor material

    2. Design Flaws: Errors in circuit design or layout that lead to operational issues

    3. Manufacturing Process Errors: Inconsistencies in fabrication processes

    4. Environmental Stress: Damage from heat, humidity, or electromagnetic interference

    5. Electrostatic Discharge (ESD): Sudden electrical discharges that damage sensitive components

    6. Electrical Overstress: Exposure to voltages or currents beyond design specifications

    7. Packaging Failures: Issues with device encapsulation or interconnects

    SEMISHARE's advanced semiconductor failure analysis tools are designed to identify and characterize these failure modes, providing manufacturers with the insights needed to enhance product reliability.

    The Art and Science of Semiconductor Failure Analysis

    Semiconductor failure analysis is a complex process that combines rigorous scientific methods with the intuitive skills of experienced analysts. SEMISHARE's approach to failure analysis encompasses both non-destructive and destructive testing methods, ensuring a comprehensive understanding of each failure case.

    Key Techniques in SEMISHARE's Failure Analysis Arsenal:

    1. Visual Inspection: High-resolution optical and electron microscopy for surface analysis

    2. Electrical Testing: Probing device characteristics to identify anomalies

    3. Thermal Imaging: Detecting hot spots and thermal irregularities

    4. X-ray Analysis: Non-destructive imaging of internal structures

    5. Decapsulation: Carefully removing packaging to access the die

    6. Chemical Etching: Selectively removing layers for internal examination

    7. Electrical Probing: Direct measurement of internal circuit nodes

    These techniques, supported by SEMISHARE's advanced tools, allow for a thorough semiconductor failure analysis process, uncovering even the most elusive failure mechanisms.

    Understanding Semiconductor Failure Rates

    Semiconductor failure rates are a critical metric in assessing device reliability. Typically expressed in Failures in Time (FIT), these rates provide valuable insights into the expected lifespan and performance of semiconductor devices under various conditions.

    Factors Influencing Semiconductor Failure Rates:

    1. Manufacturing Quality: Process control and material purity

    2. Device Complexity: More complex devices often have higher failure rates

    3. Operating Conditions: Temperature, voltage, and environmental factors

    4. Usage Patterns: Duty cycles and load variations

    5. Packaging Quality: Protection from environmental stresses

    SEMISHARE's semiconductor failure analysis tools help manufacturers accurately assess and improve failure rates, leading to more reliable and competitive products.

    The Four Major Stages of Semiconductor Processing

    Understanding the semiconductor manufacturing process is crucial for effective failure analysis. The four major stages of semiconductor processing each present unique challenges and potential failure points:

    1. Wafer Fabrication: Creating the base semiconductor material

    2. Device Isolation: Defining individual device regions on the wafer

    3. Layer Formation: Building the device's functional layers

    4. Packaging: Encapsulating and connecting the finished die

    SEMISHARE's FA Series Failure Analysis Probe Station is designed to support analysis at each of these stages, providing invaluable insights throughout the semiconductor lifecycle.

    SEMISHARE's FA Series Failure Analysis Probe Station: A Revolution in Semiconductor Failure Analysis

    The FA Series Probe Station represents the pinnacle of SEMISHARE's commitment to advancing semiconductor failure analysis. This state-of-the-art system combines optical and laser capabilities within a stable, high-precision platform, offering unparalleled performance for failure analysis laboratories.

    Key Features of the FA Series:

    1. Large Handle Drive: Ensures precise, clearance-free movement for accurate positioning

    2. Ergonomic Design: Enhances user comfort and efficiency during long analysis sessions

    3. Multi-band Laser Application: Enables fast switching and precise cutting for detailed analysis

    4. High Power Metallurgical Microscope Compatibility: Allows for fine adjustment and movement

    5. No Backtrip Difference Design: Guarantees reliable and repeatable positioning

    6. Compact Air Cooling Structure: Minimizes maintenance requirements

    7. High Precision System: Achieves laser machining accuracy up to 1x1μm

    8. Internal Anti-shock System: Ensures stable operation during sensitive procedures

    These advanced features make the FA Series an indispensable tool in modern semiconductor failure analysis, supporting the industry's drive towards ever-increasing reliability and performance.

    Conclusion: SEMISHARE's Commitment to Advanced Semiconductor Failure Analysis

    In the rapidly evolving field of semiconductor technology, the importance of effective failure analysis cannot be overstated. SEMISHARE's dedication to advancing semiconductor failure analysis ensures that manufacturers have access to the most sophisticated tools and techniques available.

    Our FA Series Failure Analysis Probe Station, along with our comprehensive suite of analysis tools, represents the cutting edge of semiconductor failure analysis technology. Whether you're conducting failure analysis on advanced ICs, investigating material defects, or optimizing your manufacturing processes, SEMISHARE provides the solutions you need to stay ahead in this competitive industry.

    By choosing SEMISHARE for your semiconductor failure analysis needs, you're not just investing in equipment – you're partnering with a leader in failure analysis technology. Our commitment to innovation, quality, and customer support ensures that you'll always have the tools and expertise needed to tackle even the most challenging failure analysis tasks.

    For more information on how SEMISHARE's semiconductor failure analysis solutions can enhance your operations, visit our website at https://www.semishareprober.com/. Discover the difference that advanced failure analysis can make in your pursuit of semiconductor excellence.

    Produktübersicht Funktionsstruktur Technische Spezifikationen Downloads
    FA-Serie Fehleranalyse-Probestation

    Product Overview

    Der FA-Serie Fehleranalyse-Probestation ist für Labore der Fehleranalyse konzipiert und bietet optische und laserbasierte Eigenschaften. Das Gerät zeichnet sich durch stabile Struktur, hervorragende Systemleistung, ergonomisches Design, einfache Bedienung und Unterstützung für multifunktionale Upgrades aus.

    Basisinformationen

    Produktnummer FA8 Arbeitsumgebung Open type
    Stromanforderungen 220VC,50~60Hz Steuerungsmodus Manual Probe Station
    Produktabmessungen 960mm long *850mm wide *1500mm high Gerätegewicht About 260 kg

    Anwendungsbereich

    Fehleranalyse von Chips in Normal-und Hoch-/Tieftemperaturumgebungen, RF-Charakterisierung fehlerhafter Bauteile, IV-/CV-Charakterisierung von Materialien/Bauteilen, Analyse interner Schaltkreise/Elektroden/PADs von Chips, Änderung interner Schaltkreise/Layer-Entfernung bei ICs/Panels

    Technische Merkmale

    Product Feature

    ●Large handle drive, no clearance movement. ●Ergonomic design, convenient and comfortable to operate. ●Multi-band laser application, fast switching and accurate cutting. ●Compatible with high power metallographic microscope for fine adjustment and movement. ●No backtrip difference design, accurate positioning. ●The air cooling structure is compact and requires no maintenance. ●High precision system, laser machining accuracy up to 1*1um. ●Leading internal anti - shock system device, more stable operation.

    Title

    Model FA series
    Specification
    Model FA-8 FA-8-SC
    Dimension L: 960mm*W: 850mm*H: 1500mm L: 880mm*W: 860mm*H: 1550mm
    Weight (about) 260KG 280KG
    Electricity Demand 220VC, 50~60Hz
    Chuck Size & Rotation angle 8", 360° Rotation
    X-Y travel range 8" * 8"
    Moving resolution 1μm
    Sample fixed mode Vacuum adsorption Vacuum adsorption
    Temperature control range - - 80~200
    Quick pull out - yes
    Electrical design Chuck Surface is Electrical Floating with Banana
    plug adapter, can be used as a backside electrode.
    Platen Specification U shape Platen, 10 micropositioners available O shape Platen, 12 micropositioners available
    Travel & adjustment mode Platen can be quickly lifted up and down 6mm with automatic locking function,Platen can be fine
    tuned up and down 25mm precisely with 1μm resolution
    Microscope Travel range X-Y: 2" * 2",            Z: 50.8mm X-Y: 1" * 1",            Z: 50.8mm
    Resolution 1μm
    Magnification 20 ~ 4000X
    Operation of lens switching Fast tilting Pneumatic lifting
    CCD pixels 50W (Analog) / 200W (Digital) / 500W (Digital)
    Laser Wavelength Wavelength selectable: 1064/532/355/266nm
    Output power 0~2.2mJ/pulse
    Micromachining capability Machinable material: Cr / Al / ITO / Ni / TFT / RGB / Poly Silicon / Mo / SiN / CF internal impurity etc.
    Precision Minimum Machinable size is 1*1μm (when using 100X lens)
    Cooling mode Air-cooled laser or Water cooled laser
    Micropositioner X-Y-Z moving range 12mm-12mm-12mm / 8mm-8mm-8mm
    Mechanical resolution 2μm / 0.7μm / 0.1μm
    Current leakage accuracy
    Coaxial 1pA/V @ 25 ℃; Three shaft 100fA/V @ 25 ℃; Triaxial 10pA@3kv @25°C,
    Test conditions: dry environment for grounding shield (air dew point lower than - 40 ° C)
    Cable connectors Banana head / Crocodile clip / Coaxial / Triaxial
    Optional Accessories Chuck fast pull-out mechanism
    Hot spot detection by liquid crystal package
    High voltage / high current test suite
    Hot chuck
    Shielding box
    Special adapter
    Vibration free table
    Gold-plated chuck
    Coaxial / Triaxial chuck
    Chuck Z quickly lifting and lowering and fine adjustment selection
    Light intensity / wavelength test
    RF test accessories
    Active probe
    Low current / Capacitance test
    Fixture for Fibre optic coupler test
    Fixture of Packaged IC test accessory
    Fixture of PCB test accessory
    Special Custom design
    Application Failure analysis of IC/LCD/OLED in varing temperature environment
    Characteristic
    Failure analysis Comfortable large handle, Driver Screws: Zero back lash
    Chip hot spot detection by liquid crystal Internal circuit/ electrode/ PAD probe
    Laser cut ,ablation and selectively remove RF Devices characteristic
    Applicable to the internal line modification /
    repair of the IC/LCD panel
    IV / CV characteristic test and failure analysis of Materials / Devices
    Up to 12 inch wafer testing Laser minimum machining size 1*1μm

    Kundendienst
    Angebotsanfrage Angebotsanfrage
    Kontakttelefon

    Kontakttelefon

    0755-2690 6952 turn 801/804/806/814

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