Our website uses cookies provided by us and third parties. Some cookies are necessary for the operation of the website, and you can adjust other cookies at any time, especially those that help us understand the performance of the website, provide you。

I accept
Name:
Phone Number*
Company Name:
mailbox*
Country*
Content:
Product Overview Functional structure Specifications Download
Mask LCVD Repair LD14

Product Overview

The mask LCVD repair equipment mainly uses laser-induced chemical vapor deposition (LCVD) technology to repair defects on the masks. The SEMISHARE LD14 series offers a wide range of deposition thickness and high repair precision. The micron-level laser precision can effectively deal with masks with extremely small pitches. With micron-level laser accuracy, it effectively addresses defects on masks with extremely small pitches, providing high-precision, low-cost repair solutions for high-value mask defects, thus significantly reducing production and operational costs for enterprises.

Basic Information

Product number LD14 working environment Enclosed
electricity demand AC 220V ±5% 50Hz Control method Full-automatic
Product Size Customizable equipment weight Customizable

Application direction

It can be used to fill in missing parts on a mask or repair patterns. This technique is often employed to fix issues like open circuits and short circuits.

Technical characteristics

Mask LCVD Repair LD14

●For products with different thicknesses and large spans, there is no need for manual adjustments when changing products; the equipment can automatically adapt to the height adjustment of the deposition head.
●The vapor deposition management control system can quantitatively evaporate materials, ensuring that long-term use does not result in prolonged deposition times due to decreased evaporation rates from material consumption, thus meeting customer demands for process stability.
●Exhaust gas recovery treatment utilizes high-temperature filters with up to dozens of layers, effectively capturing harmful components in the decomposed exhaust gas, which is then cooled and directed into the factory’s exhaust system.
●Customized products can be provided according to customer needs.


Title

Project

Description

Processing time (1 defect/piece, including positioning time)

15 s

Panel size range

5”-14”

Panel thickness

0.1-5mm

Motion resolution

±0.1μm

Repeat positioning accuracy

±1μm

Slit accuracy

≤±1μm

Autofocus objective lens switching center offset

≤±1μm

Deposition parameters

Deposition mode:Scan and Step

Deposition shape: rectangular and circular, length, width, side length or diameter
The actual size of the spot can be adjusted and displayed by software

Step deposition rectangle size range:
3μm*3μm~30μm*30μm, adjustment accuracy 1μm

Deposition edge accuracy

±0.5μm

Deposition thickness

2000 Å ~15000Å adjustable

Maximum total power

3.5KW


AC 220V ±5% 50Hz

UPS

1000VA/500W  3-20 minutes (half load)

Consumables

Compressed air CDA (0.6Mpa, 0~1L/min)

High purity argon Ar (0.6Mpa, 0~5L/min)

High purity Cr(CO)6 (purity higher than 99.8%) High purity W(CO)6 (purity higher than 99.8%) or Mo(CO)6 (purity higher than 99.8%)

Size

1230*1390*2410

Computer configuration

i5-6500CPU, 8GDDR4 memory, 128G solid state drive + 1T mechanical hard disk, 300W industrial-grade power supply, beta version win1064-bit system, PCIeX16, PCIeX4, PCI slot X5, motherboard Gigabit network port X2, serial port X6


Customer Service
Request for quotation Request for quotation
Contact number

Contact number

0755-2690 6952 turn 801/804/806/814

Send Email Send Email
© 2023 SEMISHARE CO., LTD. All Rights Reserved.粤ICP备19119103号